Study on Ionized Degree of Ar Plasma in Capillary Discharge
Abstract: Ionized degree of Ar plasma in capillary discharge soft X-ray laser or Extreme Ultraviolet Lithographic (EUVL) source research was an important parameter which determined the wavelength of the plasma source. According to the characteristics of capillary discharge and the data from literature, we deduced an experiential expression of ion-ized degree of Ar plasma in capillary discharge by analogy method. With the first set of capillary discharge EUVL source demonstrative device in China, the spectra of Ar plasma was studied. It was found from experiment that either 30 Pa Ar gas discharged by peak pulse current of -28 kA or 40 Pa Ar gas discharged by peak pulse current of -34 kA could produce Ar7+ ion. While the simulating results showed that it was necessary for the 30 Pa and 40 Pa Ar gas to be ionized to Ar7+ ion by peak pulse current of 24.4 - 39 kA and 32.7 - 52.3 kA respectively. These results proved that the experien- tial expression had some definite practical significance.
文章引用: 张兴强 , 王骐 (2013) 毛细管放电氩等离子体的电离价研究。 现代物理， 3， 27-31. doi: 10.12677/MP.2013.31005
 J. J. Rocca, V. Shlyaptsev, F. G. Tomasel, et al. Demonstration of a discharge pumped table-top soft-X-ray laser. Physical Review Letters, 1994, 73(16): 2192-2195.
 M. Yochioka, D. Bolshukhin, G. Hergenhan, et al. Progress on Xe-DPP source develop-ment for Alpha phase. Proceedings of SPIE, 2008, 6921: 69210U-1-69210U-6.
 M. Corthout, R. Apetz, J. Brudermann, et al. Sn DPP source- collector modules: Status of alpha sources, beta development and the scalability to HVM. Proceedings of SPIE, 2008, 6921: 69210V-1-69210V-12.
 Y. P. Zhao, Y. L. Cheng, B. H. Luan, et al. Effects of capillary discharge current on the time of lasing onset of soft X-ray laser at low pressure. Journal of Physics D: Applied Physics, 2006, 39: 342-346.
 T. Ceccotti. EUV lithography de-velopment in Europe: Present status and perspectives. Proceedings of SPIE, 2004, 5196: 57- 70.
 张兴强, 程元丽, 王骐等. 延时对毛细管放电类氖氩46.9 nm软X射线激光的影响[J]. 中国激光, 2008, 35(3): 363-366.
 张兴强, 程元丽, 王骐. 可用于极紫外光刻的三线毛细管的概念设计[J]. 中国激光, 2008, 35: 81-84.
 X. Q. Zhang, Y. L. Cheng and Q. Wang. Characteristics of a Ne-like Ar 46.9-nm soft X-ray laser in capillary discharge at a low Ar pressure. Laser Physics, 2008, 18(8): 958-961.
 张兴强, 程元丽, 王骐等. 主开关改进对毛细管放电软X光激光的影响[J]. 中国激光, 2009, 36(2): 324-327.
 程元丽. 毛细管放电类氖氩46.9 nm软X射线激光研究[D]. 哈尔滨工业大学工学, 2006, 3: 43-45.
 V. Bakshi, R. Lebert, B. Jagle, et al. Status report on EUV source development and EUV source applica-tions in EUVL. 23rd European Mask and Lithography Conference (EMLC), 2007, 6533: 653315-1-653315-11.