Fabrication of Si-Based 1D,2D Ordered Nano Structure by Nanoimprint Lithography
作者: 李卫 ：;
Abstract: The dimension of the microelectronic devices is reduced year by year as the development of the modern microelectronic technology. So, the research of the fabrication of nanometer structures becomes one of the most interesting topics. Nanoimprint lithography (NIL) is a more promising technology. In this paper, the process of nanoimprint lithography was introduced. And, 1-D and 2-D quartz grating molds with the period 2 µm was transferred to Si substrate by NIL. The resolution is only related to the size and the template pattern without the limitation of optical lithography exposure wavelength. AFM measurement showed the perfect fidelity of the imprint process.
文章引用: 李卫 (2011) 纳米压印技术制备硅基有序一维、二维纳米结构。 现代物理， 1， 59-65. doi: 10.12677/mp.2011.13010
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