直流磁控溅射功率对ITO薄膜光电学性能的影响
The Effects of DC Magnetron Sputtering Power on Electrical and Optical Properties of ITO Thin Films

作者: 耿志挺 , 何青 :华北电力大学能源与动力学院,北京;

关键词: ITO薄膜直流磁控溅射光电学性能ITO Thin films DC Reactive Magnetron Sputtering Electrical and Optical Properties

摘要:

本实验的ITO薄膜样品是利用直流磁控溅射技术在玻璃基片上沉积而成的。通过改变溅射功率,研究不同溅射功率对ITO薄膜光电学性能的影响。经实验测试后发现:在实验给定的功率区间内,ITO薄膜的厚度随着溅射功率的增加而增加,而其电阻率及可见光透过率则随之降低。
The experiment of ITO thin film samples was deposited on glass substrates by DC reactive magnetron sputtering. The effects of sputtering power on optical properties of ITO thin films were investigated. The results of several tests show that within the scope of the set of power, the increase of sputtering power leads to the increase of the thickness of the films, but the decrease of the resistivity and visible light transmittance of ITO thin films.

文章引用: 耿志挺 , 何青 (2014) 直流磁控溅射功率对ITO薄膜光电学性能的影响 。 材料化学前沿, 2, 43-48. doi: 10.12677/AMC.2014.23007

参考文献

[1] 吴晓飞, 郗雨林 (2013) ITO薄膜性能应用及其磁控溅射制备技术的研究. 热加工工艺, 2, 88-90.

[2] 成立顺, 孙本双, 钟景明, 等 (2008) ITO透明导电薄膜的研究进展. 稀有金属快报, 3, 10-16.

[3] 夏冬林, 杨晟, 王树林, 等 (2006) 直流磁控溅射陶瓷靶制备ITO薄膜及性能研究. 人工晶体学报, 2, 272-275.

[4] 田民波, 李正操 (2011) 薄膜技术与薄膜材料. 清华大学出版社, 北京.

[5] 苏伟涛, 余志明, 刘昕, 等 (2004) 压强对射频溅射氧化锌薄膜结构和性能的影响. 湖南有色金属, 2, 24-27.

分享
Top