Vol.2 No.1 (February 2012)
CNT Modified NiO/Ni/Si-MCP Three-Dimensional
Structure for Hybrid Supercapacitor
This paper reports the preparation of carbon nanotubes (CNTs) films on NiO/Ni/Si-silicon microchannel plates (MCP) for three-dimensional (3D) hybrid supercapacitors. The silicon MCPs are prepared by electrochemical etching and the NiO/Ni/Si-MCP structure is obtained by baking after deposition a nickel film on the sidewall of the silicon MCP by electroless deposition. The thin films of CNTs are fabricated on the structure by electrophoretic deposition (EPD). The materials are characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM). It is found that all the areas on the NiO/Ni/Si-MCP structure are homogeneously covered by carbon nanotubes. The electrochemical properties of the 3D structure are investigated by cyclic voltammetry (CV), chronopotentiometry, and cycle measurements. The structure exhibits excellent capacitive behavior with a specific capacitance of 4.1 F•cm–2, much higher than NiO/Ni/Si-MCP structure. After 2000 cycles, capacitance loss of 7.3% indicated the great stability of the structure.
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