材料科学

Vol.2 No.1 (January 2012)

真空蒸镀Nd:YAG薄膜的工艺研究
Study on the Process of Nd:Y3Al5O12 Thin Films by Evaporation Deposition

 

作者:

曾群 , 周永恒 , 任豪 , 刘颂豪

 

关键词:

电子束蒸发Nd:YAG薄膜Electron Beam Evaporation Deposition Nd:YAG Thin Film

 

摘要:

本文采用真空电子束蒸发镀膜工艺制备Nd:YAG薄膜,结合XRD、SEM等手段分析研究不同衬底材料、镀膜材料以及退火温度对薄膜材料结构的影响,并分析测试了Nd:YAG薄膜的光致发光特性。镀膜材料为Nd:YAG粉体块,Si片上沉积的Nd:YAG薄膜材料,经1100˚C退火后,具有单一YAG晶相结构,薄膜结晶晶粒均匀细小,并在室温下测试获得1064 nm主荧光峰的宽带荧光光谱。

Nd:YAG thin films have been prepared by electron beam evaporation deposition in the study. The influences of different substrates, different coating materials and annealing temperatures on the structures of Nd:YAG thin films were investigated with XRD and SEM. Also, the optical properties of Nd:YAG thin films were characterized by spec-trophotometer. The Nd:YAG thin films deposited on Si from Nd:YAG powder blocks have single YAG crystal structure after annealing at 1100˚C. And the grains of the thin film are uniform and fine. In addition, the photoluminescence spectra of Nd:YAG thin films were measured at room temperature, and photoluminescence spectrum in the region of 1064 nm peak was detected.

文章引用:

曾群 , 周永恒 , 任豪 , 刘颂豪 (2012) 真空蒸镀Nd:YAG薄膜的工艺研究。 材料科学, 2, 42-46. doi: 10.12677/ms.2012.21007

 

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