应用物理

Vol.5 No.12 (December 2015)

后退火对外延Eu0.5Ba0.5TiO3薄膜表面形貌的影响
Post-Annealed Effects on Surface Topography of Eu0.5Ba0.5TiO3 Epitaxial Thin Films

 

作者:

顾经伟 , 史志界 :苏州大学,物理与光电⋅能源学部,江苏 苏州

 

关键词:

Eu0.5Ba0.5TiO3薄膜生长后退火温度表面形貌Eu0.5Ba0.5TiO3Thin Film Annealing Temperature Surface Morphology

 

摘要:

本文利用脉冲激光沉积技术在(001)取向的SrTiO3基片上制备了外延Eu0.5Ba0.5TiO3薄膜。我们研究了后退火、微结构、表面形貌以及磁性质之间的关系。X射线衍射和卢瑟福背散射谱结果说明Eu0.5Ba0.5TiO3薄膜具有立方结构且化学计量比与块材一致。同时还发现改变后退火温度可以有效的调控薄膜晶格常数、表面粗糙度以及饱和波尔磁子的大小。

Epitaxial Eu0.5Ba0.5TiO3 thin films were deposited on (001) SrTiO3 substrates by pulsed laser deposition. The correlation between post-annealing, microstructure, surface topography and magnetic property was investigated. X-ray diffraction and Rutherford backscattering spectrometry measurements show that Eu0.5Ba0.5TiO3 thin films have a cubic structure and are stoichiometric. The variation of lattice constant, roughness and bohr magneton are strongly correlated with the anneal temperature.

文章引用:

顾经伟 , 史志界 (2015) 后退火对外延Eu0.5Ba0.5TiO3薄膜表面形貌的影响。 应用物理, 5, 165-171. doi: 10.12677/APP.2015.512023

 

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